Wafer Cleaning with PVA Roller Brushes

PVA roller brushes are widely used for cleaning after the CMP process, one of semiconductor manufacturing processes. The brush features protrusions called nodules and rotates on wafer in cleaning. This article introduces a model that uses to remove nanoscale impurities. evanescent fields prism enable us observe contact behavior clarify there is little volume near surface during sliding. We classified deformation into three types depending relative velocity nodule. A stamped occurs at negative velocity, i.e., when overtakes nodule, this related cross-contamination from brush. Finally, we present where water absorption desorption associated with nodule plays an important role impurities removal.